Quantitative analysis of silicon-oxynitride films by EPMA
Author:
Publisher
Springer Science and Business Media LLC
Subject
Analytical Chemistry
Link
http://link.springer.com/content/pdf/10.1007/BF01242917.pdf
Reference70 articles.
1. N. Shibata,Electronics and Communications in Japan, part 2 1992,75, 84.
2. S. C. Bayliss, S. J. Gurman,J. Physic., Condensed Matter,1994,6, 4961.
3. T. Ogawa, H. Nakano, T. Gocho, T. Tsumori,Proc. SPIE 1994,2197, 722.
4. S. Lim, J. H. Ryu, J. F. Wager, L. M. Casas,Thin Solid Films 1993,236, 64.
5. M. D. Diatezua, P. A. Thiry, R. Caudano,Vacuum 1995,46, 1121.
Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Experimental phase diagram study for the AlN-Al2O3-CaO system and application of thermodynamic calculations to AlN sintering process;Journal of the European Ceramic Society;2024-09
2. On the Dissociative Chemisorption of Tris(dimethylamino)silane on Hydroxylated SiO2(001) Surface;The Journal of Physical Chemistry C;2009-05-11
3. Accurate Determination of Trace Amounts of Oxygen in CrAlN Hard Coatings by a Combination of WDS–EPMA and SIMS;Microchimica Acta;2006-05-15
4. Critical evaluation of the state of the art of the analysis of light elements in thin films demonstrated using the examples of SiOXNY and AlOXNY films (IUPAC Technical Report);Pure and Applied Chemistry;2004-01-01
5. Quantitative Sputter Depth Profiling of Silicon- and Aluminium Oxynitride Films;Microchimica Acta;2000-06-19
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3