Investigation of the Negative Ions in Ar/O2 Plasma of Magnetron Sputtering Discharge with Al:Zn Target by Ion Mass Spectrometry
Author:
Publisher
Wiley
Subject
Polymers and Plastics,Condensed Matter Physics
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/ppap.201000195/fullpdf
Reference31 articles.
1. ITO coating by reactive magnetron sputtering–comparison of properties from DC and MF processing
2. Recent progress in transparent oxide semiconductors: Materials and device application
3. The growth process of plasma-deposited ITO films investigated by grazing incidence X-ray techniques
4. Influence of energetic bombardment on stress, resistivity, and microstructure of indium tin oxide films grown by radio frequency magnetron sputtering on flexible polyester substrates
5. Ion Energy Distributions in Magnetron Sputtering of Zinc Aluminium Oxide
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