The measurement and impact of negative oxygen ions during reactive sputter deposition-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

The measurement and impact of negative oxygen ions during reactive sputter deposition

Published:2023-09-21 Issue: Volume: Page:1-36
ISSN:1040-8436
Container-title:Critical Reviews in Solid State and Materials Sciences
language:en
Short-container-title:Critical Reviews in Solid State and Materials Sciences

Author:

Depla D.¹

Affiliation:

1. Department of Solid State Sciences, Ghent University, Gent, Belgium

Publisher

Informa UK Limited

Subject

Electrical and Electronic Engineering,Physical and Theoretical Chemistry,Condensed Matter Physics,General Chemical Engineering,Electronic, Optical and Magnetic Materials

Link

https://www.tandfonline.com/doi/pdf/10.1080/10408436.2023.2258159

Reference282 articles.

1. Review Article: Tracing the recorded history of thin-film sputter deposition: From the 1800s to 2017

2. VII. On the electro-chemical polarity of gases

3. A New Process of Negative Ion Formation;Arnot F. L.;IV, Proc. R. Soc. London. Ser. A. Math. Phys.,1938

4. Sputtering of Surfaces by Positive Ion Beams of Low Energy

5. Origin and Effects of Negative Ions in the Sputtering of Intermetallic Compounds

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP