ITO coating by reactive magnetron sputtering–comparison of properties from DC and MF processing-Reference-Cited by-同舟云学术

ITO coating by reactive magnetron sputtering–comparison of properties from DC and MF processing

Published:1999-08 Issue:1-2 Volume:351 Page:48-52
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

May C,Strümpfel J

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference8 articles.

1. Reactive d.c. high-rate sputtering as production technology

2. Proc. 10th Int. Conf. on Vacuum Web Coating;Saif,1996

3. Dependence of oxygen flow on optical and electrical properties of DC-magnetron sputtered ITO films

4. J. Strümpfel: Prozeβstabilisierung beim reaktiven Hochratezerstäuben mittels optischer Emissionsspektroskopie zur industriellen Herstellung von Indium-Zinn-Oxidschichten und Titandioxidsschichten, Thesis, TU Chemnitz 1991.

5. Proc. 11th Int. Conf. on Vacuum Web Coating;Strümpfel,1997

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