The growth process of plasma-deposited ITO films investigated by grazing incidence X-ray techniques
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference5 articles.
1. Study of the effect of the oxygen partial pressure on the properties of rf reactive magnetron sputtered tin-doped indium oxide films
2. Investigation of the titanium silicide formation in plasma activated physical vapour deposition
3. Investigation of plasma-deposited ITO films by GIXR and GIXRD
4. Reactive magnetron deposition of transparent conductive films
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1. Stretchable Substrates with 3D Wave Patterned Surface for Enhanced Mechanical Stability of Indium Tin Oxide Electrodes;Advanced Materials Technologies;2024-02
2. Optical Monitoring of Electrochemical Processes With ITO-Based Lossy-Mode Resonance Optical Fiber Sensor Applied as an Electrode;Journal of Lightwave Technology;2018-02-15
3. Towards high quality ITO coatings: The impact of nitrogen admixture in HiPIMS discharges;Surface and Coatings Technology;2018-02
4. Pressure dependence of Ar${\hspace{0pt}}_2^+$ , ArTi+, and Ti${\hspace{0pt}}_2^+$ dimer formation in a magnetron sputtering discharge;Journal of Physics D: Applied Physics;2017-10-12
5. Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO2 layers;Journal of Applied Physics;2017-05-07
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