Continuous Deposition of Organo-Chlorinated Thin Films by Atmospheric Pressure Dielectric Barrier Discharge in a Wire-Cylinder Configuration-Reference-Cited by-同舟云学术

Continuous Deposition of Organo-Chlorinated Thin Films by Atmospheric Pressure Dielectric Barrier Discharge in a Wire-Cylinder Configuration

Published:2014-10-18 Issue:11 Volume:11 Page:1089-1101
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Process. Polym.

Author:

Vandenabeele Cédric¹²,Maurau Rémy³,Bulou Simon¹,Siffer Frederic⁴,Gérard Mathieu¹,Belmonte Thierry²,Choquet Patrick¹

Affiliation:

1. Centre de Recherche Public-Gabriel Lippmann; 41 Rue du Brill L-4422 Belvaux Luxembourg

2. Institut Jean Lamour, UMR 7198 CNRS, Département de Chimie et Physique des Solides et des Surfaces; Université de Lorraine; Parc de Saurupt-CS 50840 F-54011 Nancy France

3. Laboratoire de Physique Subatomique et de Cosmologie; Université Joseph Fourier Grenoble 1; CNRS/IN2P3, 53 Avenue des Martyrs F-38026 Grenoble France

4. The Goodyear Tire & Rubber Company; Avenue Gordon Smith L-7750 Colmar-Berg Luxembourg

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Reference33 articles.

1. Atmospheric pressure plasmas: A review

2. Atmospheric plasmas for thin film deposition: A critical review

3. Nonequilibrium Atmospheric Plasma Deposition

4. Atmospheric Pressure Low Temperature Direct Plasma Technology: Status and Challenges for Thin Film Deposition

5. Remote Microwave PECVD for Continuous, Wide-Area Coating Under Atmospheric Pressure

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