Author:
Belmonte T.,Henrion G.,Gries T.
Publisher
Springer Science and Business Media LLC
Subject
Materials Chemistry,Surfaces, Coatings and Films,Condensed Matter Physics
Reference110 articles.
1. E. Mayer and D.E. Shea, Epitaxial Deposition of Silicon Layers by Pyrolysis of Silane, J. Electrochem. Soc., 1964, 111, p 550-556
2. F.C. Eversteijn, Gas-Phase Decomposition of Silane in a Horizontal Epitaxial Reactor, Philips Res. Rep., 1971, 26, p 134-144
3. J. Bloem and W.A.P. Claassen, Rate-Determining Reactions and Surface Species in CVD of Silicon: I. The SiH4-HCl-H2 System, J. Cryst. Growth, 1980, 49, p 435-444
4. J. Bloem and W.A.P. Claassen, Nucleation and Growth of Silicon Films by Chemical Vapour Deposition, Philips Tech. Rev., 1984, 41, p 60-69
5. M.L. Hitchman, Heterogeneous Kinetics and Mass Transport in Chemical Vapour. Deposition Processes, Prog. Cryst. Growth Charact., 1981, 4, p 249-281
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