Molecular Transfer Printing of Block Copolymer Patterns over Large Areas with Conformal Layers-Reference-Cited by-同舟云学术

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Molecular Transfer Printing of Block Copolymer Patterns over Large Areas with Conformal Layers

Published:2015-05-26 Issue:10 Volume:2 Page:1500133
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv. Mater. Interfaces

Author:

Inoue Takejiro¹,Janes Dustin W.²,Ren Jiaxing¹,Suh Hyo Seon¹³,Chen Xuanxuan¹,Ellison Christopher J.²,Nealey Paul F.¹³

Affiliation:

1. Institute for Molecular Engineering; The University of Chicago; 5801 South Ellis Avenue Chicago IL 60637 USA

2. McKetta Department of Chemical Engineering; The University of Texas at Austin; 200 East Dean Keeton Stop C0400 Austin TX 78712 USA

3. Material Science Division; Argonne National Laboratory; 9700 South Cass Avenue Lemont IL 60439 USA

Funder

Toray Industries, Inc. C.J.E.

Welch Foundation

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Reference36 articles.

1. Creation of sub-20-nm contact using diblock copolymer on a 300 mm wafer for complementary metal oxide semiconductor applications

2. Remediation of Line Edge Roughness in Chemical Nanopatterns by the Directed Assembly of Overlying Block Copolymer Films

3. Response of Block Copolymer Thin-Film Morphology to Line-Width Roughness on a Chemoepitaxial Template

4. Rectangular Patterns Using Block Copolymer Directed Assembly for High Bit Aspect Ratio Patterned Media

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Defect Annihilation in the Directed Self-Assembly of Block Copolymers in Films with Increasing Thickness;Macromolecules;2019-10-10

2. Hierarchical patterns with sub-20 nm pattern fidelity via block copolymer self-assembly and soft nanotransfer printing;Polymer Chemistry;2019

3. Effect of Ink Molecular Weights and Annealing Conditions on Molecular Transfer Printing;Chinese Journal of Polymer Science;2018-01-30

4. Determination of the maximum thickness for directed self-assembly of cylinder-forming PS-b-PMMA films on chemical patterns;Molecular Systems Design & Engineering;2018

5. Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae;ACS Nano;2017-07-20

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