Rectangular Patterns Using Block Copolymer Directed Assembly for High Bit Aspect Ratio Patterned Media
Author:
Affiliation:
1. San Jose Research Center, Hitachi Global Storage Technologies, San Jose, California 95135, United States
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/nn101561p
Reference33 articles.
1. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly
2. Directed Block Copolymer Assembly versus Electron Beam Lithography for Bit-Patterned Media with Areal Density of 1 Terabit/inch2 and Beyond
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4. Polymer self assembly in semiconductor microelectronics
5. Dynamics of pattern coarsening in a two-dimensional smectic system
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