Directed Self-Assembly Based Cut Mask Optimization for Unidirectional Design
Author:
Affiliation:
1. The University of Texas at Austin, Austin, TX, USA
2. GLOBALFOUNDRIES, Santa Clara, CA, USA
Funder
National Science Foundation (NSF)
Semiconductor Research Corporation (SRC)
Publisher
ACM
Link
https://dl.acm.org/doi/pdf/10.1145/2742060.2742114
Reference19 articles.
1. Design for Manufacturing With Emerging Nanolithography
2. Dealing with IC manufacturability in extreme scaling
3. Directed self-assembly of block copolymers for next generation nanolithography
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3. Cut Optimization;Physical Design and Mask Synthesis for Directed Self-Assembly Lithography;2018
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