OpenILT: An Open Source Inverse Lithography Technique Framework (Invited Paper)
Author:
Affiliation:
1. Chinese University of Hong Kong
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10395907/10395930/10396314.pdf?arnumber=10396314
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1. An efficient rule-based opc approach using a drc tool for 0.18/spl mu/m asic;Park
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