Author:
Ma Yuzhe,Gao Jhih-Rong,Kuang Jian,Miao Jin,Yu Bei
Cited by
27 articles.
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1. Model-based OPC Extension in OpenILT;2024 2nd International Symposium of Electronics Design Automation (ISEDA);2024-05-10
2. SwinT-ILT: Swin Transformer embedding end-to-end mask optimization model;Journal of Micro/Nanopatterning, Materials, and Metrology;2024-01-30
3. DevelSet: Deep Neural Level Set for Instant Mask Optimization;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2023-12
4. OpenILT: An Open Source Inverse Lithography Technique Framework (Invited Paper);2023 IEEE 15th International Conference on ASIC (ASICON);2023-10-24
5. CTM-SRAF: Continuous Transmission Mask-Based Constraint-Aware Subresolution Assist Feature Generation;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2023-10