DSAR
Author:
Affiliation:
1. University of Texas at Austin, Austin, USA
2. Chinese University of Hong Kong, Hong Kong, USA
3. Mentor Graphics Corporation, Austin, USA
Publisher
ACM
Link
https://dl.acm.org/doi/pdf/10.1145/3036669.3036677
Reference33 articles.
1. OpenSPARC T1. http://www.oracle.com/technetwork/systems/opensparc/index.html. OpenSPARC T1. http://www.oracle.com/technetwork/systems/opensparc/index.html.
2. Mask assignment and synthesis of DSA-MP hybrid lithography for sub-7nm contacts/vias
3. Graphoepitaxy of Self-Assembled Block Copolymers on Two-Dimensional Periodic Patterned Templates
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1. Enhanced and Efficient Guiding Template Design for Lamellar DSA With Graph Monomorphism;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2023-11
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3. Guiding template design for lamellar DSA with multiple patterning and self-aligned via process;Proceedings of the 39th International Conference on Computer-Aided Design;2020-11-02
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