Directed self-assembly of block copolymers for next generation nanolithography-Reference-Cited by-同舟云学术

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Directed self-assembly of block copolymers for next generation nanolithography

Published:2013-12 Issue:12 Volume:16 Page:468-476
ISSN:1369-7021
Container-title:Materials Today
language:en
Short-container-title:Materials Today

Author:

Jeong Seong-Jun,Kim Ju Young,Kim Bong Hoon,Moon Hyoung-Seok,Kim Sang Ouk

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference79 articles.

1. International Technology Roadmap for Semiconductors (ITRS) 2012 Edition,2012

2. Block Copolymer Thermodynamics: Theory and Experiment

3. Block Copolymers—Designer Soft Materials

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