3-D Micro Machining of Photo Sensitive Glass Using Gray-Scale Mask-Reference-Cited by-同舟云学术

3-D Micro Machining of Photo Sensitive Glass Using Gray-Scale Mask

Published:2002 Issue:11 Volume:122 Page:531-536
ISSN:1341-8939
Container-title:IEEJ Transactions on Sensors and Micromachines
language:en
Short-container-title:IEEJ Trans. SM

Author:

Kanomata Gaku¹,Matsumoto Yoshinori¹

Affiliation:

1. Faculty of Science and Technology, Department of Applied Physics and Physico-Informatics, Keio University

Publisher

Institute of Electrical Engineers of Japan (IEE Japan)

Subject

Electrical and Electronic Engineering,Mechanical Engineering

Link

https://www.jstage.jst.go.jp/article/ieejsmas/122/11/122_11_531/_pdf

Reference5 articles.

1. (1) W. Daschner, P. Long, R. Stein, C. Wu, and S.H. Lee: “Cost-effective mass fabrication of multilevel diffractive optical elements by use of a single optical exposure with a gray-scale mask on high-energy beam-sensitive glass”, Appl. Opt., 36, 2, pp.4675-4680 (1997)

2. (2) M.R. Wang and H. Su: “Laser direct-write gray-lebel mask and one-step etching for diffractive microloens fabrication”, Appl. Opti., 37, 32, pp.7568-7576 (1998)

3. (3) K. Feindt, A. Harnisch, V. Zoppig, D. Hulsenberg, and E. Kallenbach: “3D-Structuring of Photosensitive Glasses”, Proc. MEMS98, pp.207-211 (1998)

4. (4) C. Gimkiewicz, D. Hagedorn, Jurgen Jahns, E. Kley, and F. Thoma: “Fabrication of microprisms for planar optical interconnections by use of analog gray-scale lithograpy with high-energy-beam-sensitive glass”, Appl. Opti., 38, 14, pp.2986-2990 (1999)

5. (8) T. Fujimura, S. Etoh, S. Ishikawa, A. Ikeda, R. Hattori, and Y. Kuroki: “New Microchip-Based Capillary Electrophoresis Device for Biochemical Analysis”, Int. Sympo. on Smart Struct. and Microsyst. (2000)

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