Extreme-ultraviolet spectral purity and magnetic ion debris mitigation by use of low-density tin targets
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference19 articles.
1. Soft x-ray production from laser produced plasmas for lithography applications
2. Ultimate Efficiency of Extreme Ultraviolet Radiation from a Laser-Produced Plasma
3. Erosion and degradation of EUV lithography collector mirrors under particle bombardment
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