Affiliation:
1. Fraunhofer Institute for Laser Technology ILT, Steinbachstr. 15, D-52074 Aachen, Germany
Abstract
The concept of dense and hot plasmas can be used to build up powerful and brilliant radiation sources in the soft X-ray and extreme ultraviolet spectral range. Such sources are used for nanoscale imaging and structuring applications, such as EUV lithography in the semiconductor industry. An understanding of light-generating atomic processes and radiation transport within the plasma is mandatory for optimization. The basic principles and technical concepts using either a pulsed laser or a gas discharge for plasma generation are presented, and critical aspects in the ionization dynamics are outlined within the framework of a simplified atomic physics model.
Subject
Condensed Matter Physics,Nuclear and High Energy Physics,Atomic and Molecular Physics, and Optics
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