Ion energy distributions in highly transient EUV induced plasma in hydrogen
Author:
Affiliation:
1. University of Technology Eindhoven, Eindhoven, The Netherlands
2. ASML, Veldhoven, The Netherlands
Funder
ASML
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5017303
Reference43 articles.
1. Interstellar H3+
2. Kinetic simulation of an extreme ultraviolet radiation driven plasma near a multilayer mirror
3. Comparison of H2and He carbon cleaning mechanisms in extreme ultraviolet induced and surface wave discharge plasmas
4. Exploring the temporally resolved electron density evolution in extreme ultra-violet induced plasmas
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