CNT-based pellicles for the next generation of EUV scanners

Abstract

Abstract There has been growing interest among advanced semiconductor manufacturers in pellicles that can withstand conditions in extreme ultraviolet (EUV) photolithography. The pellicle must have high mechanical toughness, high transparency in EUV radiation, thermal stability, and chemical stability for ionized and atomic hydrogen. For the above expectations, our experience shows that the carbon nanotube (CNT) yields the most promising results due to its outstanding mechanical and thermal properties. We are developing thin, free-standing CNT films for EUV pellicle application using a liquid filtration manufacturing method. This method has the advantage of producing highly uniform films, allowing us to use a variety of CNT types while avoiding the use of harsh chemicals. To advance our hypothesis, we will examine and discuss EUV radiation durability results evaluated with the NewSUBARU synchrotron light facility.