Advanced particle contamination control in EUV scanners-Reference-Cited by-同舟云学术

Advanced particle contamination control in EUV scanners

Published:2019-03-26 Issue: Volume: Page:
ISSN:
Container-title:Extreme Ultraviolet (EUV) Lithography X
language:
Short-container-title:

Author:

van de Kerkhof Mark A.,van Empel Tjarko,Lercel Michael,Smeets Christophe,van de Wetering Ferdi,Nikipelov Andrey,Cloin Christian,Yakunin Andrei,Banine Vadim E.

Publisher

SPIE

Reference12 articles.

1. EUV Lithography Performance for Manufacturing: Status and Outlook;Pirati,2016

2. EUV for HVM: towards an industrialized scanner for HVM NXE3400B;van Es,2018

3. Enabling sub-10nm node lithography: presenting NXE:3400B;van de Kerkhof,2017

4. Adhesion Mechanisms on Solar Glass: Effects of Relative Humidity, Surface Roughness, and Particle Shape and Size;Moutinho,2017

5. Developments in Surface Contamination and Cleaning;Kohli,2016

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