The influence of an externally applied electric field on residual microparticle charge in a spatio-temporal afterglow plasma

Author:

van Huijstee J. C. A.1ORCID,Blom P.2ORCID,Beckers J.1ORCID

Affiliation:

1. Department of Applied Physics, Eindhoven University of Technology 1 , P.O. Box 513, 5600 MB Eindhoven, The Netherlands

2. VDL Enabling Technologies Group 2 , P.O. Box 80038, 5600 JW Eindhoven, The Netherlands

Abstract

The residual charge of dust particles in spatial and temporal afterglow plasmas is relevant in many fundamental research fields and technological applications. It has been shown in both spatial and temporal afterglow plasmas that the presence of an externally applied electric field can greatly influence the residual dust particle charge. However, this has not yet been explored in a combined spatiotemporal afterglow plasma. In this work, the influence of an externally applied electric field on the residual microparticle charge is, therefore, investigated in a spatiotemporal afterglow plasma. It is found that the measured charge is predominantly affected by changes to the spatial component of the spatiotemporal afterglow when an electric field is applied, while the influence on the temporal component seems to be significantly less relevant. Our results contribute to an improved understanding of particle (de-)charging in afterglow plasmas and are highly relevant to the design of applications in which afterglow plasmas are present and where the charge of dust particles needs to be controlled for the sake of (nano)contamination control.

Funder

VDL Enabling Technologies Group

Publisher

AIP Publishing

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3