Computational proximity lithography with extreme ultraviolet radiation
Author:
Funder
Horizon 2020 Framework Programme
Helmholtz Association
Bundesministerium für Bildung und Forschung
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference25 articles.
1. Achromatic Talbot lithography with partially coherent extreme ultraviolet radiation: process window analysis
2. Resolution enhanced proximity printing by phase and amplitude modulating masks
3. Resolution enhancement for advanced mask aligner lithography using phase-shifting photomasks
4. Diffraction-assisted extreme ultraviolet proximity lithography for fabrication of nanophotonic arrays
5. Extreme ultraviolet proximity lithography for fast, flexible and parallel fabrication of infrared antennas
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