Resolution enhanced proximity printing by phase and amplitude modulating masks-Reference-Cited by-同舟云学术

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Resolution enhanced proximity printing by phase and amplitude modulating masks

Published:2001-08-10 Issue:5 Volume:11 Page:603-611
ISSN:0960-1317
Container-title:Journal of Micromechanics and Microengineering
language:
Short-container-title:J. Micromech. Microeng.

Author:

Bühling Sven,Wyrowski Frank,Kley Ernst-Bernhard,Nellissen A J M,Wang Lingli,Dirkzwager Maarten

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,Electronic, Optical and Magnetic Materials

Reference12 articles.

1. Simulation of proximity printing

2. Three-dimensional simulation of proximity printing

3. Phase-shifting masks for microlithography: automated design and mask requirements

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. Computational proximity lithography with extreme ultraviolet radiation;Optics Express;2020-08-28

3. Computer simulation of diffraction focusing in proximity lithography;SECOND INTERNATIONAL CONFERENCE ON MATERIAL SCIENCE, SMART STRUCTURES AND APPLICATIONS: ICMSS-2019;2019

4. 175 nm period grating fabricated by i-line proximity mask-aligner lithography;Optics Letters;2017-09-21

5. High-resolution proximity lithography for nano-optical components;Microelectronic Engineering;2015-01

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