Computer simulation of diffraction focusing in proximity lithography

Author:

Tsvetkov Yu. B.

Publisher

AIP Publishing

Reference20 articles.

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4. The Design and Manufacturing of Diffraction Optical Elements to form a Dot-Composed Etalon Image within the Optical Systems

5. Moiseev K. M., YAnovich S. V., Panfilov YU. V. Modifikaciya poverhnosti sinteticheskoj opalovoj matricy vakuumnymi metodami / Moiseev K. M., YAnovich S. V., Panfilov YU. V. // Nanoinzheneriya. - 2012. - № 1. - S. 4–7.

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