Diffraction-assisted extreme ultraviolet proximity lithography for fabrication of nanophotonic arrays-Reference-Cited by-同舟云学术

Diffraction-assisted extreme ultraviolet proximity lithography for fabrication of nanophotonic arrays

Published:2013-03 Issue:2 Volume:31 Page:021602
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Danylyuk Serhiy,Kim Hyun-su,Brose Sascha,Dittberner Carsten,Loosen Peter,Taubner Thomas,Bergmann Klaus,Juschkin Larissa

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4789445

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