Holographic masks for computational proximity lithography with EUV radiation

Author:

Danylyuk S.,Deuter Valerie,Grochowicz Maciej,Biller Jan,Brose Sascha,Taubner Thomas,Grützmacher Detlev,Juschkin Larissa

Publisher

SPIE

Reference9 articles.

1. Achromatic Talbot lithography with partially coherent extreme ultraviolet radiation: process window analysis;Brose;J. of Micro/Nanolithography, MEMS MOEMS,2016

2. Diffraction-assisted extreme ultraviolet proximity lithography for fabrication of nanophotonic arrays

3. Resolution enhancement for advanced mask aligner lithography using phase-shifting photomasks

4. Proximity printing by wave-optically designed masks;Wyrowski,2001

5. Optimized phaseshifting masks for high-resolution resist patterning by intereference lithography;Brose,2017

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