Achromatic Talbot lithography with partially coherent extreme ultraviolet radiation: process window analysis-Reference-Cited by-同舟云学术

Achromatic Talbot lithography with partially coherent extreme ultraviolet radiation: process window analysis

Published:2016-10-17 Issue:4 Volume:15 Page:043502
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Brose Sascha¹,Tempeler Jenny¹,Danylyuk Serhiy¹,Loosen Peter¹,Juschkin Larissa²

Affiliation:

1. RWTH Aachen University, Jülich Aachen Research Alliance-Fundamentals of Future Information Technology, Chair for the Technology of Optical Systems, Steinbachstrasse 15, Aachen 52074, Germany

2. RWTH Aachen University, Jülich Aachen Research Alliance-Fundamentals of Future Information Technology, Chair for the Experimental Physics of EUV, Steinbachstrasse 15, Aachen 52074, GermanycResearch Center Jülich, Peter Grünberg Institute 9, Jülich Aachen Research Alliance-Fundamentals of Future Information Technology, Wilhelm-Johnen-Straße, Jülich 52428, Germany

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

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5. Fabrication of nanostructures with long-range order using block copolymer lithography

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