Mask aligner lithography using laser illumination for versatile pattern generation
Author:
Funder
Bundesministerium für Bildung und Forschung (BMBF)
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference29 articles.
1. Investigation of high-resolution contact printing
2. Advanced mask aligner lithography: new illumination system
3. Computational algorithms for optimizing mask layouts in proximity printing
4. Advanced mask aligner lithography: fabrication of periodic patterns using pinhole array mask and Talbot effect
5. Optimized lithography process for through-silicon vias-fabrication using a double-sided (structured) photomask for mask aligner lithography
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