Author:
Hirscher S.,Kümmel M.,Kirch O.,Domke W.-D.,Wolter A.,Käsmaier R.,Buschbeck H.,Cekan E.,Chalupka A.,Chylik A.,Eder S.,Horner C.,Löschner H.,Nowak R.,Stengl G.,Windischbauer T.,Zeininger M.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference6 articles.
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3. M. Yoshikawa, S. Moriya, Comparative study of resolution limiting factors in electron beam lithography using the edge roughness evaluation model, EIPBN’2001, J. Vac. Sci. Technol. B (2001) in press.
4. MNE’2000;Hirscher;Microelectron. Eng.,2001
5. EIPBN’2000;Ruchhoeft;J. Vac. Sci. Technol.,2000
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