Reference86 articles.
1. Haller, I., M. Hazakis, and R. Srinivasan, High resolution positive resists for electron beam exposure. IBM J. Res. Develop., 1968. 12(251).
2. Mayadas, A.F. and R.B. Laibowitz, One-dimensional superconductors. Phys. Rev. Lett., 1972. 28: p. 156.
3. Yamazaki, K. and H. Namatsu, 5-nm-order electron-beam lithography for nanodevice fabrication. Jpn. J. Appl. Phys., 2004. 43(6B): p. 3767.
4. Swanson, L.W., Liquid metal ion sources – mechanism and application. Nucl. Instrum. Methods Phy. Res., 1983. 218(1–3): p. 347.
5. Cui, Z., Electron beam lithography (Chapter 3), in Micro-Nanofabrication Technologies and Applications. 2006, Springer.
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