Vapor-phase etch processes for silicon MEMS
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Elsevier
Reference51 articles.
1. The role of the Casimir effect in the static deflection and stiction of membrane strips in microelectromechanical systems (MEMS);Serry;J. Appl. Phys.,1998
2. Stiction of surface machined microstructures after rinsing and drying: model and investigation of adhesion mechanisms;Legtenberg;Sens. Actuators, A,1994
3. Dry release of metal structures in oxygen plasma: process characterization and optimization;Bartek;J. Micromech. Microeng.,1998
4. Polyimide sacrificial layer and novel materials for post-processing surface micromachining;Bagolini;J. Micromech. Microeng.,2002
5. C. Leinenbach, H. Seidel, T. Fuchs, S. Kronmueller, F. Laermer, A novel sacrificial layer technology based on highly selective etching of silicon-germanium in ClF3, in: Proc. IEEE MEMS 2007, Kobe, 2007, p. 65.
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