Simulation of the effect of parasitic channel height on characteristics of stacked gate-all-around nanosheet FET

Author:

Choi Yunho,Lee Kitae,Yeon Kim Kyoung,Kim Sihyun,Lee Junil,Lee Ryoongbin,Kim Hyun-Min,Suh Song Young,Kim Sangwan,Lee Jong-Ho,Park Byung-Gook

Funder

MOTIE

KSRC

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference22 articles.

1. 50 nm – Gate All Around (GAA) – Silicon On Nothing (SON) – devices: a simple way to co-integration of GAA transistors within bulk MOSFET process;Monfray;VLSI Symp Tech Dig,2002

2. Novel 3D integration process for highly scalable Nano-Beam stacked-channels GAA (NBG) FinFETs with HfO2/TiN gate stack;Ernst;IEDM Tech Dig,2006

3. High-Performance Fully Depleted Silicon Nanowire (Diameter ≤ 5 nm) Gate-All-Around CMOS Devices;Singh;IEEE Electron Dev Lett,2006

4. Novel integration process and performances analysis of low STandby Power (LSTP) 3D multi-channel CMOSFET (MCFET) on SOI with metal/high-K gate stack;Bernard;VLSI Symp Tech Dig,2008

5. Experimental study on carrier transport limiting phenomena in 10 nm width nanowire CMOS transistors;Tachi;IEDM Tech Dig,2009

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