Stress evolution during isochronal annealing of Ni/Si system
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
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1. Effects of an epitaxial graphene layer for the growth of nickel silicides on a Ni(111) substrate;Applied Surface Science;2023-02
2. Solid-state reaction in Ni/Si multilayered films, characterized by magneto-optical and optical spectroscopies;INT J MATER RES;2022
3. Effect of thicknesses on phase formation of nickel silicide thin films by RTA process;Integrated Ferroelectrics;2016-05-03
4. Macroscopic and nanometer scale stress measurement of Ni(Pt)Si silicide: Impact of thermal treatments ranging from millisecond to several hours;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2014-01
5. Magnetization anisotropy of Ni dots with several tens of nanometer diameter;Solid State Communications;2009-06
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