Effect of thicknesses on phase formation of nickel silicide thin films by RTA process
Author:
Publisher
Informa UK Limited
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Ceramics and Composites,Control and Systems Engineering,Electronic, Optical and Magnetic Materials
Link
http://www.tandfonline.com/doi/pdf/10.1080/10584587.2016.1174916
Reference24 articles.
1. The fabrication of nickel silicide ohmic contacts to n-type 6H-silicon carbide
2. A novel two step metallization of Ni/Cu for low concentrator c-Si solar cells
3. Effect of electroless nickel on the series resistance of high-efficiency inkjet printed passivated emitter rear contacted solar cells
4. Influence of Nickel Silicide Thin Film on Series Resistance of Silicon Solar Cells
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