Formation and stability of silicides on polycrystalline silicon-Reference-Cited by-同舟云学术

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Formation and stability of silicides on polycrystalline silicon

Published:1996-02 Issue:2 Volume:16 Page:43-96
ISSN:0927-796X
Container-title:Materials Science and Engineering: R: Reports
language:en
Short-container-title:Materials Science and Engineering: R: Reports

Author:

Colgan E.G.,Gambino J.P.,Hong Q.Z.

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Reference168 articles.

1. Thin Films—Interdiffusion and Reactions;Tu,1978

2. Reliability and Degradation;Ottaviani,1981

3. Kinetics of formation of silicides: A review

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