Surface hydride composition of plasma deposited hydrogenated amorphous silicon: in situ infrared study of ion flux and temperature dependence-Reference-Cited by-同舟云学术

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Surface hydride composition of plasma deposited hydrogenated amorphous silicon: in situ infrared study of ion flux and temperature dependence

Published:2003-04 Issue:1-2 Volume:530 Page:1-16
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Marra D.C,Kessels W.M.M,van de Sanden M.C.M,Kashefizadeh K,Aydil E.S

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference63 articles.

1. Modulated molecular-beam studies of the surface chemistry of silicon reaction with reactive gases

2. Silicon hydride etch products from the reaction of atomic hydrogen with Si(100)

3. Decomposition mechanisms of SiHx species on Si(100)‐(2×1) for x=2, 3, and 4

4. H-induced surface restructuring on Si(100): Formation of higher hydrides

5. An atomically resolved scanning tunneling microscopy study of the thermal decomposition of disilane on Si(001)

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1. High-Throughput Low Frequency Reactor for Non-Thermal Plasma Synthesis of Amorphous Silicon Nanoparticles;Silicon;2023-12-05

2. Reactive force-field molecular dynamics simulation for the surface reaction of SiH (x = 2–4) species on Si(1 0 0)-(2 × 1):H surfaces in chemical vapor deposition processes;Computational Materials Science;2022-03

3. Effect of etching time in hydrofluoric acid on the structure and morphology of n-type porous silicon;Applied Surface Science;2020-12

4. Precise measurement of the temperature of a silicon wafer by an optical-interference contactless thermometer during rapid plasma processing;Journal of Applied Physics;2020-05-29

5. Evolution of medium-range order and surface compositions by mechanism-driven model with realistic network;Applied Surface Science;2019-01

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