Interface control of tetragonal ferroelectric phase in ultrathin Si-doped HfO2 epitaxial films-Reference-Cited by-同舟云学术

Interface control of tetragonal ferroelectric phase in ultrathin Si-doped HfO2 epitaxial films

Published:2021-04 Issue: Volume:207 Page:116696
ISSN:1359-6454
Container-title:Acta Materialia
language:en
Short-container-title:Acta Materialia

Author:

Li Tao,Dong Juncai,Zhang Nian,Wen Zicheng,Sun Zhenzhong,Hai Yang,Wang Kewei,Liu Huanyu,Tamura Nobumichi,Mi Shaobo,Cheng Shaodong,Ma Chuansheng,He Yunbin^ORCID,Li Lei,Ke Shanming,Huang Haitao,Cao Yongge

Publisher

Elsevier BV

Subject

Metals and Alloys,Polymers and Plastics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference39 articles.

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