Work function shifts and variations of ionization probabilities occurring during SIMS analyses using an in situ deposition of Cs0
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
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1. Evaluation of a cesium positive ion source for secondary ion mass spectrometry
2. A new secondary ion mass spectrometry technique for III‐V semiconductor compounds using the molecular ions CsM+
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5. On the use of CsX+ cluster ions for major element depth profiling in secondary ion mass spectrometry
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