Carrier activation in in situ Si-doped GaAs layers fabricated by a focused Si ion beam and molecular beam epitaxy combined system

Author:

Hada Takuo,Miyamoto Hirotaka,Yanagisawa Junichi,Wakaya Fujio,Yuba Yoshihiko,Gamo Kenji

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Argon ions deeply implanted in silicon studied by Rutherford/Elastic Backscattering and Grazing Incidence X-ray Fluorescence spectroscopy;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2019-07

2. Probing high-energy ion-implanted silicon by micro-Raman spectroscopy;Journal of Raman Spectroscopy;2014-05-30

3. Investigation of deep implanted carbon and oxygen channeling profiles in [110] silicon, using d-NRA and SEM;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2014-02

4. Micro-Raman depth profiling of silicon amorphization induced by high-energy ion channeling implantation;Journal of Raman Spectroscopy;2013-01-10

5. Depth profiling of high energy nitrogen ions implanted in the 〈100〉, 〈110〉 and randomly oriented silicon crystals;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2012-03

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