Preparation of high-purity Cu films by non-mass separated ion beam deposition
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference14 articles.
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3. Precise analysis of H, C, N, and O as dominant impurities in Cu films: complementary use of SIMS and GDMS;Metals and Materials International;2005-08
4. Precise impurity analysis of Cu films by GDMS: relation between negative substrate bias voltage and impurity ionization potentials;Applied Physics A;2005-02
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