Influence of negative substrate bias voltage on the impurity concentrations in Zr films
Author:
Publisher
Elsevier BV
Subject
Condensed Matter Physics,General Materials Science
Reference16 articles.
1. Highly conformal ZrO2 deposition for dynamic random access memory application
2. Structural and dielectric properties of thin ZrO2 films on silicon grown by atomic layer deposition from cyclopentadienyl precursor
3. Metalorganic precursor decomposition and oxidation mechanisms in plasma-enhanced ZrO2 deposition
4. Trace Impurity Analysis in Ta Films Using Glow Discharge Mass Spectrometry: Concentration Change of Impurities by Applying Negative Substrate Bias Voltage
5. Aspects of quantitative secondary ion mass spectrometry
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1. Thin film performance from hybrid PVD-powder coating process;Surface and Coatings Technology;2013-12
2. A study of suppression effect of oxygen contamination by bias voltage in reactively sputtered ZrN films;Surface and Coatings Technology;2012-01
3. Preparation of ZrO2 dielectric layers by subsequent oxidation after Zr film deposition with negative substrate bias voltage;Metals and Materials International;2010-06
4. Effect of UV lamp irradiation during oxidation of Zr/Pt/Si structure on electrical properties of Pt/ZrO2/Pt/Si structure;Applied Surface Science;2010-03
5. Characterization studies of pulse magnetron sputtered hard ceramic titanium diboride coatings alloyed with silicon;Acta Materialia;2008-09
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