Precise impurity analysis of Cu films by GDMS: relation between negative substrate bias voltage and impurity ionization potentials
Author:
Publisher
Springer Science and Business Media LLC
Subject
General Materials Science,General Chemistry
Link
http://link.springer.com/content/pdf/10.1007/s00339-003-2373-4.pdf
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Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Effect of Negative Substrate Bias Voltage on the Nucleation and Growth of Cu Films during the Initial Stage of Ion Beam Deposition;Metals and Materials International;2008-06-23
2. Atomic Spectroscopy;Analytical Chemistry;2006-05-11
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