Improved ion beam deposition system with RF sputter-type ion source-Reference-Cited by-同舟云学术

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Improved ion beam deposition system with RF sputter-type ion source

Published:1997-01 Issue:1-4 Volume:121 Page:102-106
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Miyake Kiyoshi,Ohashi Kenya

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference7 articles.

1. Proc. 1st Int. Conf. on Ultra High Purity Base Metals;Miyake,1995

2. Advanced Materials '93, II/Information Storage Materials;Takahashi,1994

3. Superior Corrosion Resistance of Ion Beam Deposited Iron Film

4. Formation of iron film by ion beam deposition

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Characteristics of ion beam deposited copper thin films as a seed layer: effect of negative substrate bias voltage;Thin Solid Films;2003-06

2. Effect of substrate bias voltage on the purity of Cu films deposited by non-mass separated ion beam deposition;Thin Solid Films;2003-06

3. Preparation of high-purity Cu films by non-mass separated ion beam deposition;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2003-05

4. Microstructure of high-purity Fe films deposited by the non-mass-separated ion beam deposition method;Materials Chemistry and Physics;1998-07

5. Techniques for the sputtering of optimum indium-tin oxide films on to room-temperature substrates;Surface and Coatings Technology;1998-02

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