The role of carboxylic acids on nanoparticle removal in post CMP cleaning process for cobalt interconnects

Author:

Zhang Lifei,Lu Xinchun,Busnaina Ahmed A.ORCID

Publisher

Elsevier BV

Subject

Condensed Matter Physics,General Materials Science

Reference37 articles.

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5. Reliability study on cobalt and ruthenium as alternative metals for advanced interconnects;Varela Pedreira;IEEE Int. Reliab. Phys. Symp. Proc.,2017

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