Effects of two mild amino acids on benzotriazole residue desorption during cobalt post-chemical mechanical polishing cleaning: Experimental and theoretical studies-Reference-Cited by-同舟云学术

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Effects of two mild amino acids on benzotriazole residue desorption during cobalt post-chemical mechanical polishing cleaning: Experimental and theoretical studies

Published:2024-02 Issue: Volume:683 Page:133052
ISSN:0927-7757
Container-title:Colloids and Surfaces A: Physicochemical and Engineering Aspects
language:en
Short-container-title:Colloids and Surfaces A: Physicochemical and Engineering Aspects

Author:

Ji Jinbo,Tan Baimei^ORCID,Zhang Nannan,Ma Tengda,Xu Yi,Zhang Shihao^ORCID,Shi Yunhui,Guo Lei^ORCID

Funder

Natural Science Foundation of Hebei Province

National Science and Technology Major Project

Natural Science Foundation of Fujian Province

Publisher

Elsevier BV

Subject

Colloid and Surface Chemistry

Reference54 articles.

1. Miniaturization of CMOS;Radamson;Micromachines,2019

2. Characterization of 1, 2, 4-triazole as corrosion inhibitor for chemical mechanical polishing of cobalt in H2O2Based acid slurry;He;ECS J. Solid State Sci. Technol.,2019

3. Non-contact post-CMP megasonic cleaning of cobalt wafers;Zhang;Mater. Sci. Semicond. Process.,2023

4. The role of carboxylic acids on nanoparticle removal in post CMP cleaning process for cobalt interconnects;Zhang;Mater. Chem. Phys.,2022

5. Environment friendly chemical mechanical polishing of copper;Zhang;Appl. Surf. Sci.,2019

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