Investigation of the inhibition properties and mechanism of salicylaldoxime for copper corrosion via experimental and theoretical methods-Reference-Cited by-同舟云学术

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Investigation of the inhibition properties and mechanism of salicylaldoxime for copper corrosion via experimental and theoretical methods

Published:2024-04 Issue: Volume:173 Page:108141
ISSN:1369-8001
Container-title:Materials Science in Semiconductor Processing
language:en
Short-container-title:Materials Science in Semiconductor Processing

Author:

Hu Lianjun^ORCID,Chen Qi,Fang Qi,Pan Guofeng,He Jiting,Zhang Yong

Publisher

Elsevier BV

Reference73 articles.

1. Potassium tartrate as a complexing agent for chemical mechanical polishing of Cu/Co/TaN barrier liner stack in H2O2 based alkaline slurries;Hu;Mater. Sci. Semicond. Process.,2020

2. Effect of ethylenediamine on CMP performance of ruthenium in H2O2-based slurries;Xu;RSC Adv.,2022

3. Synergetic effect of 5-methyl-1H-benzotriazole and Sodium Dodecyl benzene sulfonate on CMP performance of ruthenium barrier layer in KIO4-based slurry;Xu;ECS J. Solid State Sci. Technol.,2020

4. A novel green chemical mechanical polishing for potassium dihydrogen phosphate using corn oil slurry;Cui;Mater. Today Sustain.,2022

5. Experimental and computational investigation of complexing agents on copper dissolution for chemical mechanical polishing process;Hu;Colloids Surf. A Physicochem. Eng. Asp.,2023

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