Effect of ethylenediamine on CMP performance of ruthenium in H2O2-based slurries
Author:
Affiliation:
1. School of Electronics and Information Engineering, Hebei University of Technology, Tianjin 300130, People's Republic of China
2. Tianjin Key Laboratory of Electronic Materials and Devices, Tianjin 300130, People's Republic of China
Abstract
Funder
National Science and Technology Planning Project
National Natural Science Foundation of China
Natural Science Foundation of Hebei Province
Publisher
Royal Society of Chemistry (RSC)
Subject
General Chemical Engineering,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2022/RA/D1RA08243D
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1. Controlling Ta phase in Ta/TaN bilayer by surface pre-treatment on TaN
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5. Diffusion Studies of Copper on Ruthenium Thin Film
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