Generation and decomposition of volatile tin hydrides monitored by in situ quartz crystal microbalances-Reference-Cited by-同舟云学术

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Generation and decomposition of volatile tin hydrides monitored by in situ quartz crystal microbalances

Published:2012-11 Issue: Volume:552 Page:122-125
ISSN:0009-2614
Container-title:Chemical Physics Letters
language:en
Short-container-title:Chemical Physics Letters

Author:

Ugur D.,Storm A.J.,Verberk R.,Brouwer J.C.,Sloof W.G.

Funder

Surface Physics for Advanced Manufacturing

Publisher

Elsevier BV

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Reference29 articles.

1. Progress in EUV optics lifetime expectations

2. Novel chamber cleaning method using atomic hydrogen generated by hot catalyzer

3. Characterization of Cu surface cleaning by hydrogen plasma

4. GaAs surface cleaning by low-energy hydrogen ion bombardment at moderate temperatures

5. Atomic hydrogen cleaning of polar III–V semiconductor surfaces

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1. Science challenges and research opportunities for plasma applications in microelectronics;Journal of Vacuum Science & Technology B;2024-06-03

2. In-situ non-destructive removal of tin particles by low-energy plasma for imitation of EUV optical mirrors self-cleaning;Vacuum;2023-06

3. Feasibility study on reactive ion etching occurrence in EUV-induced photoionized hydrogen plasmas based on electron temperature and electron density measurements;Japanese Journal of Applied Physics;2022-04-22

4. Low‐temperature reduction of SnO ₂ by floating wire‐assisted medium‐pressure H ₂ /Ar plasma;Plasma Processes and Polymers;2022-02-21

5. Investigation of a facile plasma-driven method for in situ cleaning of metal-based contamination;Plasma Science and Technology;2022-01-01

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