Low‐temperature reduction of SnO 2 by floating wire‐assisted medium‐pressure H 2 /Ar plasma
Author:
Affiliation:
1. Nagoya University Nagoya Japan
2. Toyota Technological Institute Nagoya Japan
Publisher
Wiley
Subject
Polymers and Plastics,Condensed Matter Physics
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/ppap.202100209
Reference37 articles.
1. J.Sporre D.Elg D.Andruczyk T.Cho D. N.Ruzic S.Srivastava D. C.Brandt inProc. Extrem. Ultrav. Lithogr. III 8322 SPIE Advanced Lithography San Jose CA2012 p.83222L.https://doi.org/10.1117/12.916434
2. Decomposition of SnH4 molecules on metal and metal–oxide surfaces
3. Generation and decomposition of volatile tin hydrides monitored by in situ quartz crystal microbalances
4. Sn etching with hydrogen radicals to clean EUV optics
5. D. J. W.Klunder vanM. M. J. W.Herpen V. Y.Banine K.Gielissen Proc. Emerg. lithogr. Technol. IX 5751 SPIE Advanced Lithography San Jose CA2005 p.943.https://doi.org/10.1117/12.619568
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