Anomalously low-lying lowest excited triplet state of SiH2FCHCH2: an ab initio molecular orbital study
Author:
Publisher
Elsevier BV
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Reference15 articles.
1. Excited states and photochemistry of saturated molecules. IX. Vertical excited states of silane
2. Excited states and photochemistry of saturated molecules. The 1B1(1T2) surface in silane11Supported in part by National Science Foundation grant CHE7818070.
3. On the primary process in the plasma‐chemical and photochemical vapor deposition from silane. Mechanism of the radiative species SiH*(A 2Δ) formation
4. On the primary process in plasma-chemical and photochemical vapor deposition from silane: An ab initio study of unimolecular decomposition of SiH4 in the lowest triplet state
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1. Structures of the main precursors and initial decomposition products of diborane chemical vapor deposition: an experimental and ab initio molecular orbital study;Chemical Physics Letters;2000-07
2. Highly cross-linked polymer networks of amorphous silicon alloys: Quantum chemical studies on plasma and photochemical processes;Progress in Polymer Science;1996
3. SiH3CH3+F: A Potential Reaction System for Preparing Uniform SiC Film Predicted by Using an Ab Initio Molecular Orbital Method;Japanese Journal of Applied Physics;1994-09-15
4. Initial elementary processes in tetrafluoroethylene plasma: Anabinitiomolecular orbital study;Journal of Applied Physics;1993-12
5. A selection rule in SiHn(n=1–4)+F reactions: An ab initio molecular orbital study;The Journal of Chemical Physics;1993-02-15
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